This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: The Boeing Company. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: Amanda Simpson: Innovator in Electron Beam Lithography
Introduction
Amanda Simpson is a prominent inventor based in Thousand Oaks, CA (US). She has made significant contributions to the field of electron beam lithography, showcasing her expertise and innovative spirit. Her work has implications for various applications in material processing and technology.
Latest Patents
Amanda holds a patent for her invention titled "Electron beam lithography with a bilayer resist." This patent describes a method, apparatus, and system for processing a material stack. The process involves depositing a hydrogen silsesquioxane layer on the material stack, followed by a diffusion barrier layer. This bilayer structure enhances the longevity of the hydrogen silsesquioxane layer, allowing for precise exposure during electron beam lithography. The electron beam is directed through the bilayer to create an exposed portion, which is then developed, leaving the desired features intact on the material stack.
Career Highlights
Amanda is currently employed at The Boeing Company, where she applies her knowledge and skills in innovative technologies. Her work at Boeing reflects her commitment to advancing engineering and technology in the aerospace sector.
Collaborations
Amanda has collaborated with notable colleagues, including Antonio Mei and Ivan Milosavljevic. These partnerships have fostered a creative environment that encourages the exchange of ideas and expertise.
Conclusion
Amanda Simpson is a trailblazer in the field of electron beam lithography, with a patent that demonstrates her innovative approach to material processing. Her contributions to The Boeing Company and collaborations with fellow inventors highlight her impact on technology and engineering.