Noida, India

Aman Taneja

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Aman Taneja. Retrieved from https://idiyas.com/inventor/aman-taneja

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of Aman Taneja

Introduction

Aman Taneja is an accomplished inventor based in Noida, India. He has made significant contributions to the field of environmental technology. His innovative approach has led to the development of a unique patent that addresses environmental profiling.

Latest Patents

Aman Taneja holds a patent titled "Method and apparatus for environmental profile generation." This patent describes a method for generating an environmental profile by capturing images of an environment with recording devices. The process involves detecting changes in objects within the environment based on the captured images and generating an environmental profile accordingly. This invention showcases his commitment to advancing environmental technology.

Career Highlights

Aman Taneja is currently employed at Samsung Electronics Co., Ltd. His role at this leading technology company allows him to work on cutting-edge innovations. His expertise in environmental profiling has positioned him as a valuable asset in his field.

Collaborations

Aman has collaborated with talented coworkers, including Mayank Jain and Nishant Bugalia. Their teamwork has contributed to the successful development of innovative solutions in their projects.

Conclusion

Aman Taneja's contributions to environmental technology through his patent and work at Samsung Electronics Co., Ltd. highlight his innovative spirit and dedication to creating impactful solutions. His work continues to inspire advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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