Allister W E Dann

Title: Allister W E Dann: Innovator in Layer Processing Technology

Introduction

Allister W E Dann is a notable inventor based in Malvern, GB. He has made significant contributions to the field of layer processing technology. His innovative approach has led to the development of a unique patent that enhances the growth of layer structures on substrate surfaces.

Latest Patents

Allister W E Dann holds a patent for a method of layer processing. This method involves supplying a vapor mixture stream to a substrate to deposit constituents. The growth of the layer is monitored using an ellipsometer, which provides real-time feedback for growth control of successive pseudo-layers. A Bayesian algorithm is employed to predict a probability density function for pseudo-layer growth parameters. This prediction is based on initial surface composition, growth conditions, and associated growth probabilities. The algorithm assigns weights to samples representing occurrence likelihoods based on the most recent sensor output. A subset of these samples is selected, favoring those with greater weights, to provide a subsequent predicted probability density function for further iterations of pseudo-layer growth.

Career Highlights

Allister W E Dann is associated with Qinetiq Limited, where he applies his expertise in layer processing technology. His work has been instrumental in advancing the capabilities of substrate surface treatments. With a focus on innovation, he continues to contribute to the field through his research and development efforts.

Collaborations

Allister has collaborated with notable colleagues, including John L Glasper and David John Robbins. These partnerships have fostered a collaborative environment that enhances the development of innovative technologies.

Conclusion

Allister W E Dann is a distinguished inventor whose work in layer processing technology has made a significant impact. His innovative methods and collaborative efforts continue to push the boundaries of what is possible in substrate surface treatments.