Hawkhurst, United Kingdom

Allan Marshall

This inventor holds 1 USPTO granted patent and 2 EPO patents. Top assignee: Merck Patent Gmbh. Active years: 2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Allan Marshall. Retrieved from https://idiyas.com/inventor/allan-marshall-an5g8dr6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: The Innovations of Allan Marshall

Introduction

Allan Marshall is a notable inventor based in Hawkhurst, GB. He has made significant contributions to the field of polymer technology, particularly through his innovative methods of preparing anisotropic polymer films. His work has implications for various applications, including optical and electrooptical devices.

Latest Patents

Allan holds a patent for a "Method of preparing an anisotropic polymer film on a substrate with a structured surface." This invention focuses on creating an anisotropic polymer film with improved alignments by coating it onto a specially structured substrate. The resulting polymer films are particularly useful in decorative and security applications, showcasing the practical benefits of his research.

Career Highlights

Throughout his career, Allan has worked with prominent companies such as Merck Patent GmbH and Omnova Wallcovering (UK) Limited. His experience in these organizations has allowed him to refine his skills and contribute to advancements in polymer technology.

Collaborations

Allan has collaborated with notable professionals in his field, including Matthias Kuntz and John Patrick. These partnerships have further enriched his work and expanded the impact of his inventions.

Conclusion

Allan Marshall's innovative approach to polymer films has positioned him as a key figure in the industry. His patent and collaborations reflect his commitment to advancing technology for practical applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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