Allan Ketelsen

Title: Allan Ketelsen: Innovator in Lithographic Patterning Systems

Introduction

Allan Ketelsen is a notable inventor based in Chandler, AZ (US). He has made significant contributions to the field of microelectronics through his innovative patent. His work primarily focuses on lithographic patterning systems, which are essential in the manufacturing of microelectronic devices.

Latest Patents

Allan Ketelsen holds a patent titled "Method to achieve tilted patterning with a through resist thickness." This patent describes a lithographic patterning system that includes an actinic radiation source and a stage designed to support a substrate with a resist layer. The system features a first prism that is substantially parallel to the major surface of the stage, enhancing the precision of microelectronic device fabrication. The patent is a testament to his expertise and innovative approach in the field, with a total of 1 patent to his name.

Career Highlights

Allan Ketelsen is currently employed at Intel Corporation, a leading company in the technology sector. His role at Intel allows him to work on cutting-edge technologies and contribute to advancements in microelectronics. His dedication to innovation has positioned him as a valuable asset in his field.

Collaborations

Allan has collaborated with various professionals, including his coworker Changhua Liu. These collaborations have likely fostered an environment of creativity and innovation, leading to advancements in their respective projects.

Conclusion

Allan Ketelsen's contributions to lithographic patterning systems exemplify his commitment to innovation in microelectronics. His patent and work at Intel Corporation highlight his role as a key inventor in this critical field.