This inventor holds 4 USPTO granted patents. Top assignees: Anitec Image Corporation, International Paper Company. Active years: 1987-1996.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Endicott, NY (US) (1987 - 1993)
- Vestal, NY (US) (1996)
Company Filing History:
Years Active: 1987-1996
Title: The Innovative Contributions of Allan J Wexler
Introduction
Allan J Wexler is a notable inventor based in Endicott, NY (US). He has made significant contributions to the field of photographic materials through his innovative patents. With a total of 4 patents, Wexler's work has had a lasting impact on the industry.
Latest Patents
Wexler's latest patents include an antistatic layer for photographic elements. This invention features a polymer entity composed of a water-soluble, electrically conductive polyelectrolyte, such as poly(sodium styrenesulfonate) homopolymer. The antistatic layer is designed to protect photographic materials by conferring antistatic properties. Another notable patent involves compositions useful as dot promoting agents, which disclose novel compounds with specific chemical formulas that enhance photographic processes.
Career Highlights
Throughout his career, Wexler has worked with reputable companies, including Anitec Image Corporation and International Paper Company. His experience in these organizations has contributed to his expertise in the field of photographic technology.
Collaborations
Wexler has collaborated with various professionals, including Bruce M Resnick, to further advance his innovative projects.
Conclusion
Allan J Wexler's contributions to the field of photographic materials through his patents demonstrate his commitment to innovation and excellence. His work continues to influence the industry and inspire future advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile