Farmington Hills, MI, United States of America

Allan H Syrop

This inventor holds 1 USPTO granted patent. Top assignee: Basf Corporation. Active years: 2000.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Allan H Syrop. Retrieved from https://idiyas.com/inventor/allan-h-syrop-2rt7wkxj

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2000

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1 patent (USPTO):Explore Patents

Title: Innovations of Allan H Syrop in Polyurethane Foams

Introduction

Allan H Syrop is a notable inventor based in Farmington Hills, MI (US). He has made significant contributions to the field of polyurethane foams, particularly in enhancing their substrate adhesion characteristics. His work has implications for various applications in the materials industry.

Latest Patents

Allan H Syrop holds a patent for "Low density rigid polyurethane foams having improved substrate adhesion." This invention relates to polyurethane foams that utilize an imidazole compound, which provides enhanced substrate adhesion at relatively low mold temperatures. The patent also covers the resin compositions used in these foams and the methods for producing them.

Career Highlights

Syrop is associated with BASF Corporation, a leading company in the chemical industry. His work at BASF has allowed him to focus on innovative solutions in material science, particularly in the development of advanced polyurethane foams.

Collaborations

One of his notable collaborators is Robert S Coleman. Together, they have worked on projects that push the boundaries of material properties and applications.

Conclusion

Allan H Syrop's contributions to the field of polyurethane foams demonstrate his innovative spirit and commitment to advancing material science. His patent reflects a significant step forward in improving substrate adhesion, which can lead to enhanced performance in various applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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