Allan D Doley

Title: Innovations of Allan D Doley in Semiconductor Processing

Introduction

Allan D Doley is a notable inventor based in Phoenix, AZ, who has made significant contributions to the field of semiconductor processing. With a focus on enhancing the efficiency and safety of semiconductor manufacturing, Doley has developed innovative solutions that address critical challenges in the industry.

Latest Patents

Doley holds a patent for a "Semiconductor processing system with gas curtain." This invention introduces a gas curtain designed to prevent unwanted gases from entering a processing chamber. The gas curtain features both upward and downward flows of gas surrounding an isolation valve adjacent to a delivery port into the processing chamber. In the valve open position, the downward flow extends between the valve and the delivery port, while the upward flow moves in the opposite direction behind the isolation valve. When the valve is closed, one of the flows extends through a slot in the isolation valve, and the other flow is directed in the opposite direction on the rear side of the isolation valve. The method of using this gas curtain involves a pick-up wand operating on a Bernoulli principle, which switches gases just prior to loading wafers into the processing chamber. The second gas used is desirably hydrogen, which helps remove fugitive particles, moisture, and unwanted gases before entering the processing chamber.

Career Highlights

Doley is associated with Advanced Semiconductor Materials America, Inc., where he has been instrumental in advancing semiconductor technologies. His work has contributed to the development of safer and more efficient semiconductor processing systems.

Collaborations

Throughout his career, Doley has collaborated with notable colleagues, including Dennis L Goodwin and Mark R Hawkins. These collaborations have fostered innovation and have led to advancements in semiconductor processing technologies.

Conclusion

Allan D Doley's contributions to semiconductor processing through his innovative patent demonstrate his commitment to improving the industry. His work continues to influence the field, paving the way for future advancements in semiconductor technology.