This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2000-2001.
Company Filing History:
Years Active: 2000-2001
Title: Innovations of Allan D'Ambra in Plasma Technology
Introduction
Allan D'Ambra is a notable inventor based in Milbrae, CA, who has made significant contributions to the field of plasma technology. With a total of 2 patents, his work focuses on advanced plasma reactors that utilize innovative antenna designs to enhance plasma generation and processing.
Latest Patents
D'Ambra's latest patents include a "Plasma reactor with internal inductive antenna capable of generating helicon wave" and a "Plasma reactor with multiple small internal inductive antennas." The first patent describes a reactor that employs an internal inductive antenna designed to generate a helicon wave for plasma generation. This invention features various embodiments, including loop-type and flat coil-type antennas, constructed to prevent sputtering and optimize heat transfer within the chamber. The second patent introduces a reactor that utilizes multiple small inductive antennas to create a processing plasma. This design allows for the optimization of plasma characteristics by adjusting the number, location, and orientation of the antennas within the chamber.
Career Highlights
Allan D'Ambra is currently associated with Applied Materials, Inc., a leading company in the field of materials engineering. His work at the company has been instrumental in advancing plasma technology applications in various industries.
Collaborations
Throughout his career, D'Ambra has collaborated with notable colleagues, including Yan Ye and Yeuk-Fai Edwin Mok, contributing to the development of innovative solutions in plasma processing.
Conclusion
Allan D'Ambra's contributions to plasma technology through his patents and collaborations highlight his role as a significant inventor in the field. His innovative approaches continue to influence advancements in plasma reactors and processing techniques.