Neuss, Germany

Alissa Besler

This inventor holds 3 USPTO granted patents and 5 published patent applications and 5 EPO patents. Top assignee: Henkel Ag & Company, Kgaa. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alissa Besler. Retrieved from https://idiyas.com/inventor/alissa-besler

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.6

ph-index = 1


Company Filing History:


Years Active: 2026

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3 patents (USPTO):Explore Patents

Title: Alissa Besler - Innovator in Acrylic Composition and Electrode Manufacturing

Introduction

Alissa Besler is an accomplished inventor based in Düsseldorf, Germany. She is currently associated with Henkel AG & Company, KGaA, where she contributes her expertise in innovative materials and manufacturing processes. Despite having no granted patents to her name, her work in the field of acrylic compositions and skin-compatible electrodes showcases her commitment to advancing technology.

Latest Patent Applications

Alissa's latest patent applications include:

1. **Two Component (2K) Acrylic Composition Comprising a Thermoplastic Polyurethane** - This application focuses on a two-component composition that enhances the properties of acrylic materials.

2. **Manufacturing of Skin-Compatible Electrodes** - This application describes a method for producing skin-compatible electrodes by printing a circuit pattern onto a flexible substrate. The process involves creating an electrically conductive pattern that includes an electrode pad area, followed by the application of an adhesive interface layer.

Conclusion

Alissa Besler's innovative work in acrylic compositions and electrode manufacturing highlights her potential as a leading inventor in her field. Her contributions, although not yet reflected in granted patents, demonstrate her dedication to advancing technology and improving material applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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