Liverpool, United Kingdom

Alison R Dunne

This inventor holds 1 USPTO granted patent. Top assignee: Gec Plessey Telecommunications Limited. Active years: 1992.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alison R Dunne. Retrieved from https://idiyas.com/inventor/alison-r-dunne

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: The Innovations of Alison R Dunne

Introduction

Alison R Dunne is a notable inventor based in Liverpool, GB. She has made significant contributions to the field of technology, particularly in the area of printed circuit board (PCB) assembly. Her innovative approach has led to the development of a unique method that enhances the efficiency of PCB manufacturing.

Latest Patents

Alison holds 1 patent for her invention titled "Customized alignment for PCB assembly." This patent discloses a method and apparatus for article registration, where surface characteristics such as component locations of printed circuit boards are viewed and compared with a model. The differences identified are stored for subsequent use, particularly in the placement of components on the boards.

Career Highlights

Alison is currently employed at GEC Plessey Telecommunications Limited, where she applies her expertise in technology and innovation. Her work has been instrumental in advancing the capabilities of PCB assembly processes.

Collaborations

Throughout her career, Alison has collaborated with notable colleagues, including Stephen Mainwaring and Arthur B Clough. These partnerships have contributed to her success and the development of her innovative solutions.

Conclusion

Alison R Dunne's contributions to the field of PCB assembly demonstrate her commitment to innovation and technology. Her patent reflects her ability to solve complex problems and improve manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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