Aline Collin

Title: Aline Collin: Innovator in EUV Lithography

Introduction

Aline Collin is a prominent inventor based in Fairbanks, AK (US). She has made significant contributions to the field of microelectronics through her innovative work in EUV lithography. Her expertise and dedication to advancing technology have led to the development of novel methods that enhance the fabrication of microelectronic structures.

Latest Patents

Aline Collin holds a patent for "Assist layers for EUV lithography." This invention provides novel methods of fabricating microelectronics structures using EUV lithographic processes. The method involves utilizing an assist layer immediately below the photoresist layer, which can be applied directly to the substrate or to any intermediate layers. The preferred assist layers are formed from spin-coatable, polymeric compositions. This inventive method allows for reduced critical dimensions to be achieved with improved dose-to-size ratios, while also enhancing adhesion and reducing or eliminating pattern collapse issues.

Career Highlights

Aline Collin is currently employed at Brewer Science, Inc., where she continues to push the boundaries of innovation in her field. Her work has not only contributed to her company's success but has also had a lasting impact on the microelectronics industry.

Collaborations

Aline has collaborated with talented individuals such as Tantiboro Ouattara and Carlton Ashley Washburn. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Aline Collin's contributions to EUV lithography exemplify her commitment to innovation and excellence in the field of microelectronics. Her work continues to inspire future advancements in technology.