Company Filing History:
Years Active: 1976-1981
Title: Alfred Politycki: Innovator in CVD Coating Technology
Introduction
Alfred Politycki is a notable inventor based in Ottobrunn, Germany. He has made significant contributions to the field of chemical vapor deposition (CVD) technology, holding a total of 5 patents. His work has been instrumental in advancing the efficiency and effectiveness of coating small parts.
Latest Patents
Politycki's latest patents include a CVD coating device for small parts. This innovative apparatus is designed for the chemical vapor deposition treatment of small components. The device allows for the articles to be treated on a frame, with the CVD treatment occurring within a heated receptor. The movable deposition material feed line ensures a more uniform coating. Following the CVD treatment, the coating can be hardened by detaching the supporting frame from the hot receptor, allowing for rapid quenching in circulating cooling air.
Another significant patent is a method and masking structure for configurating thin layers. This method is particularly useful in thin film circuits. It involves irradiating a layer with an electron beam that passes through a mask, achieving a configuration that corresponds to selected portions of the mask. The design of the mask ensures that the electron beam effectively radiates the geometric shadow areas of the supporting elements on the thin film.
Career Highlights
Alfred Politycki is currently employed at Siemens Aktiengesellschaft, where he continues to innovate and develop new technologies. His work at Siemens has allowed him to collaborate with other talented professionals in the field.
Collaborations
Some of his notable coworkers include Konrad Hieber and Manfred Stolz. Their collaborative efforts have contributed to the advancement of various projects within the company.
Conclusion
Alfred Politycki's contributions to CVD technology and thin film circuits highlight his role as a leading inventor in his field. His innovative patents and ongoing work at Siemens demonstrate his commitment to advancing technology.