The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1976
Filed:
May. 21, 1975
Alfred Politycki, Ottobrunn, DT;
Siemens Aktiengesellschaft, Berlin & Munich, DT;
Abstract
A method of forming an iris diaphragm for use in a corpuscular beam apparatus and having a thin metal layer with at least one opening and an integral reinforcing portion of the same metal which is set back from each of the openings characterized by providing a substrate with the first mask leaving an unexposed surface of the configuration of the thin metal layer, applying a thin metal layer on the exposed surface, forming a second mask having configuration of the reinforcing portion of the iris diaphragm and including a portion covering the thin metal layer adjacent each opening, applying a second thicker layer of the same metal to form a reinforcing portion and subsequently removing the iris diaphragm from the surface of the substrate. Preferably, each of the masks are formed by a photo development process and the metal layers are applied by electro-depositing.