Alfred O Passano, Jr

Title: Alfred O Passano, Jr: Innovator in Photo Exposure Technology

Introduction

Alfred O Passano, Jr. is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of photo exposure technology, particularly in the analysis of materials through innovative apparatuses. His work has implications for various industries, especially in the realm of material science.

Latest Patents

Alfred O Passano, Jr. holds a patent for an "Apparatus for photo exposure of materials with subsequent capturing of volatiles for analysis." This invention enables real-time analysis of output volatiles upon UV exposure using a laboratory-scale apparatus. The methods and apparatus utilize external or internal radiation sources, particularly broad band external UV radiation. This technology is especially beneficial for the analysis and screening of photoresist materials, employing FTIR or MS analysis for accurate results. He has 1 patent to his name.

Career Highlights

Alfred O Passano, Jr. is associated with International Business Machines Corporation (IBM), where he has contributed to various projects and innovations. His expertise in photo exposure technology has positioned him as a valuable asset within the company.

Collaborations

Throughout his career, Alfred has collaborated with notable colleagues, including Mark S Chace and John E Darney. These collaborations have further enhanced the development and application of his innovative technologies.

Conclusion

Alfred O Passano, Jr. exemplifies the spirit of innovation in the field of photo exposure technology. His contributions through patents and collaborations continue to influence material analysis and screening processes.