Alexander L Flamholz

Title: Innovations of Alexander L Flamholz

Introduction

Alexander L Flamholz is a notable inventor based in Monsey, NY (US). He has made significant contributions to the field of x-ray technology, holding a total of 6 patents. His work has advanced the methods and systems used in x-ray scanning and lithography.

Latest Patents

Flamholz's latest patents include an innovative x-ray beam scanning method designed to produce low distortion or constant results. This method involves directing an x-ray beam at a collimating first mirror, which can alter the source to mirror location and/or grazing angle of incidence. The beam is then reflected from a flat second mirror that is capable of scanning motion through linear translation, with an optional angular change in the grazing angle of incidence. Another significant patent is for a segmented mask and exposure system for x-ray lithography. This design replaces a single large area membrane with a set of smaller membranes, or segments, fabricated on a single mask substrate. The segments are arranged serially, allowing them to be sequentially aligned and exposed by a shaped x-ray beam.

Career Highlights

Flamholz has had a distinguished career at International Business Machines Corporation (IBM), where he has been able to apply his innovative ideas and technical expertise. His work has contributed to the advancement of x-ray technologies, making them more efficient and effective.

Collaborations

Throughout his career, Flamholz has collaborated with notable coworkers such as Ronald S Charsky and Robert P Rippstein. These collaborations have further enhanced his contributions to the field.

Conclusion

Alexander L Flamholz is a prominent inventor whose work in x-ray technology has led to several important patents. His innovative methods and systems continue to influence the industry, showcasing his dedication to advancing technology.