Alexander Kostenko

Title: Innovations of Alexander Kostenko in Chemical Vapor Deposition

Introduction

Alexander Kostenko is an accomplished inventor based in Dutchess County, NY (US). He holds three patents, showcasing his expertise in the field of chemical vapor deposition. His work has significantly contributed to advancements in the production of high-quality aluminum oxide films.

Latest Patents

One of Kostenko's latest patents is an apparatus for chemical vapor deposition of aluminum oxide. This innovative apparatus monitors the actual wafer/substrate temperature during the deposition process. It enables the production of high-quality aluminum oxide films with real-time wafer/substrate control. An infrared (IR) temperature monitoring device is utilized to maintain the actual wafer temperature at the process temperature setpoint. This advancement eliminates the need for atmospheric temperature probing, test runs, and monitor wafers, thereby reducing operating costs. The apparatus allows for the deposition of uniform aluminum oxide films on silicon substrates without additional photolithographic steps, resulting in fewer process steps and anticipated savings in equipment, cycle time, and chemicals. The design incorporates a heated source material, heated delivery lines, heated inert gas purge lines, a pressure differential mass flow controller, a control system with related valving, and a vacuum process chamber with temperature-controlled walls. This complete source delivery system accurately and repeatably provides source vapor for LPCVD deposition of aluminum oxide onto silicon substrates.

Career Highlights

Kostenko's career is marked by his significant contributions to the field of chemical vapor deposition. His innovative approaches have led to improved efficiency and quality in the production processes he has worked on. He is currently employed at International Business Machines Corporation, where he continues to develop cutting-edge technologies.

Collaborations

Throughout his career, Kostenko has collaborated with notable colleagues, including Steven G Barbee and Richard Anthony Conti. These collaborations have further enhanced his work and contributed to the success of various projects.

Conclusion

Alexander Kostenko's innovations in chemical vapor deposition have made a lasting impact on the industry. His patents reflect his commitment to advancing technology and improving production processes. His work continues to inspire future developments in the field.