Alexander F Liu

Title: Innovations of Alexander F Liu

Introduction

Alexander F Liu is a notable inventor based in San Jose, CA. He has made significant contributions to the field of plasma etching technology. With a total of 3 patents to his name, Liu's work focuses on improving the reliability and efficiency of endpoint detection in plasma etch processes.

Latest Patents

One of Liu's latest patents is titled "Method and apparatus for detecting optimal endpoints in plasma etch processes." This invention presents an improved method for specifying and reliably detecting endpoints in processes such as plasma etching. The method addresses challenges such as degraded signal-to-noise ratios caused by factors like "cloudy window" and low ratios of reactive surface area to non-reactive surface area. The invention samples signals produced by photo-sensitive equipment, digitally filters and cross-correlates the data, and normalizes it using an average normalization value. Furthermore, it provides additional noise reduction through three modes of endpoint specification and detection. These modes require a pre-specified number of consecutive samples to exhibit certain behaviors before the endpoint is deemed detected, allowing for fine control of the etch time.

Career Highlights

Throughout his career, Alexander F Liu has worked with prominent companies in the technology sector. Notably, he has been associated with Lam Research Corporation and Atalla Technovations Company. His experience in these organizations has contributed to his expertise in the field of plasma etching.

Collaborations

Liu has collaborated with various professionals in his field, including Martin M Atalla, who has been a significant coworker in his endeavors.

Conclusion

Alexander F Liu's innovative contributions to plasma etching technology demonstrate his commitment to advancing the field. His patents reflect a deep understanding of the challenges faced in this area and provide effective solutions for improved processes.