Enschede, Netherlands

Alexander Dijkshoorn

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Ultimaker B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alexander Dijkshoorn. Retrieved from https://idiyas.com/inventor/alexander-dijkshoorn

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Alexander Dijkshoorn and In-Situ Monitoring of Additive Manufacturing.

Introduction

Alexander Dijkshoorn is an inventor associated with Enschede, the Netherlands. His patent work includes an invention for monitoring additive manufacturing processes in situ.

Latest Patents

Dijkshoorn is associated with 1 patent: “In-situ monitoring of additive manufacturing.” The invention describes a system that builds a product from electrically conductive material deposited onto a support element or previously deposited material. Two electrodes are positioned at the support element, and at least one electrode electrically contacts the material during deposition. The deposited material forms an electrically conductive path between the electrodes, enabling in-situ monitoring during the manufacturing process.

Career Highlights

The provided career information associates Dijkshoorn with Ultimaker B.V. and Neuvel, Patrick. The available details do not specify his roles or dates of employment.

Collaborations

His listed coworkers include Stefano Stramigioli and Patrick Neuvel. The information provided does not specify the nature of their collaborations.

Conclusion

Alexander Dijkshoorn’s patent describes an electrode-based approach to monitoring conductive material as it is deposited, connecting his work with process monitoring in additive manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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