Fishkill, NY, United States of America

Alexander D Lopata


Average Co-Inventor Count = 5.6

ph-index = 3

Forward Citations = 181(Granted Patents)


Company Filing History:


Years Active: 1984-1989

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3 patents (USPTO):

Title: Innovations of Alexander D Lopata

Introduction

Alexander D Lopata is a notable inventor based in Fishkill, NY (US). He has made significant contributions to the field of integrated circuit manufacture, holding a total of 3 patents. His work focuses on advancing lithographic techniques, which are crucial for the production of modern electronic devices.

Latest Patents

One of his latest patents is titled "Mask using lithographic image size reduction." This patent discloses a process for reducing lithographic image size for integrated circuit manufacture. A mask of photosensitive material is formed on a substrate, with an opening of a minimum size dictated by the limits of lithography. The reduction in image size is achieved by establishing sidewalls to the interior vertical surfaces of the opening through the deposition of a conformal layer, followed by anisotropic etching. The dimension of the opening is reduced by the combined thickness of the two opposite insulator sidewalls. This innovative process allows for the creation of a photomask or stencil with a pattern of openings smaller than what is possible through traditional lithography.

Career Highlights

Alexander D Lopata is currently employed at International Business Machines Corporation (IBM), where he continues to develop cutting-edge technologies in the field of semiconductor manufacturing. His expertise in lithography and integrated circuit design has positioned him as a key player in the industry.

Collaborations

Throughout his career, Alexander has collaborated with several talented individuals, including Anthony F Scaduto and Nicholas J Giammarco. These collaborations have further enhanced his innovative capabilities and contributed to the success of his projects.

Conclusion

Alexander D Lopata's contributions to the field of integrated circuit manufacture through his patents and work at IBM highlight his role as a significant inventor. His innovative approaches to lithographic image size reduction are paving the way for advancements in technology.

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