Palo Alto, CA, United States of America

Alex R Shimkunas

This inventor holds 1 USPTO granted patent. Top assignee: Nanostructures, Inc.. Active years: 1990.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alex R Shimkunas. Retrieved from https://idiyas.com/inventor/alex-r-shimkunas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 54(Granted Patents)


Company Filing History:


Years Active: 1990

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1 patent (USPTO):Explore Patents

Title: Alex R Shimkunas: Innovator in Silicon Shadow Mask Technology

Introduction

Alex R Shimkunas is a notable inventor based in Palo Alto, California. He has made significant contributions to the field of semiconductor technology, particularly in the development of high-resolution silicon shadow masks. His innovative approach has the potential to enhance various applications in electronics and optics.

Latest Patents

Shimkunas holds a patent for a "Method for making high resolution silicon shadow masks." This invention describes a process for creating a high-resolution shadow mask with low pattern distortion. The method involves forming a silicon membrane with a pattern of apertures etched through it by reactive ion etching, utilizing a silicon dioxide masking layer. The key to achieving low distortion over a large area is controlling the stress of both the membrane and the masking layer. This ensures that the stress relief during aperture formation remains negligible. The process also includes a p/n junction electrochemical etch-stop method to create a controlled stress silicon membrane, followed by coating it with a silicon dioxide layer and a photoresist layer for patterning.

Career Highlights

Alex R Shimkunas is currently employed at Nanostructures, Inc., where he continues to push the boundaries of innovation in semiconductor technology. His work has been instrumental in advancing the capabilities of silicon shadow masks, which are crucial for high-precision applications in the electronics industry.

Collaborations

Throughout his career, Shimkunas has collaborated with esteemed colleagues such as Philip E Mauger and Junling J Yen. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the impact of their collective work.

Conclusion

Alex R Shimkunas is a pioneering inventor whose contributions to the field of silicon shadow masks are noteworthy. His innovative methods and collaborative spirit continue to influence advancements in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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