Hamburg, Germany

Alex Erfurt

This inventor holds 1 USPTO granted patent. Top assignee: Focke & Co. (Gmbh & Co. Kg). Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alex Erfurt. Retrieved from https://idiyas.com/inventor/alex-erfurt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Alex Erfurt - Innovator in Adhesive Application Technology

Introduction

Alex Erfurt is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of adhesive application technology. His innovative approach has led to the development of a unique method and device for applying portions of adhesive.

Latest Patents

Erfurt holds a patent for a "Method and device for applying portions of adhesive." This invention involves a process where individual portions of adhesive are applied successively using a valve. The valve is operated by energizing a coil of an electromagnet with an actuation voltage pulse for each dispensing. This mechanism allows for precise control over the adhesive application, ensuring that the actual opening duration of the valve is adjusted to compensate for electromagnetic interference effects.

Career Highlights

Alex Erfurt is currently employed at Focke & Co. (Gmbh & Co. Kg), where he continues to innovate in the field of adhesive technologies. His work has been instrumental in enhancing the efficiency and effectiveness of adhesive application processes.

Collaborations

Erfurt collaborates with talented coworkers, including Martin Wiehe and Rene Knupper. Their combined expertise contributes to the advancement of adhesive application technologies.

Conclusion

Alex Erfurt's contributions to adhesive application technology exemplify the spirit of innovation. His patent reflects a commitment to improving industrial processes through inventive solutions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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