Erin, NY, United States of America

Alex D Service

This inventor holds 1 USPTO granted patent. Top assignee: Westinghouse Electric Corporation. Active years: 1986.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: Innovations of Alex D Service

Introduction

Alex D Service is an accomplished inventor based in Erin, NY (US). He has made significant contributions to the field of ionization technology, particularly with his innovative patent that enhances the sensitivity response of ion chambers.

Latest Patents

One of his notable patents is titled "Ion chamber with a flat sensitivity response characteristic." This invention provides an ion chamber that exhibits a flat response to a wide range of incident gamma energy. The design utilizes a high-pressure fill gas mixture consisting of a low atomic number gas, which reduces gamma response at low energy levels, and a high atomic number gas, which increases gamma response at low energy levels. The preferred fill gas mixture includes nitrogen as the major constituent and xenon as the minor constituent. This innovation is crucial for improving the accuracy and reliability of gamma radiation measurements.

Career Highlights

Alex D Service is associated with Westinghouse Electric Corporation, where he has contributed to various projects and advancements in technology. His work has been instrumental in developing solutions that address complex challenges in the field of radiation detection and measurement.

Collaborations

Throughout his career, Alex has collaborated with notable colleagues, including Norman P Goldstein and William H Todt. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Alex D Service's contributions to the field of ionization technology through his patent and collaborations highlight his role as a significant inventor. His work continues to influence advancements in radiation measurement technology.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
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