Company Filing History:
Years Active: 2000
Title: Alessandro Corradi: Innovator in Silicon Wafer Technology
Introduction
Alessandro Corradi is a notable inventor based in Milan, Italy. He has made significant contributions to the field of semiconductor technology, particularly in the processing of silicon wafers. His innovative approach has led to advancements that are crucial for the electronics industry.
Latest Patents
Corradi holds a patent for a process titled "Process for the removal of copper from polished boron doped silicon." This patent describes a method for effectively removing copper from a boron-doped, polished silicon wafer. The process involves annealing the wafer at a temperature of at least about 75°C to enhance the concentration of copper on the polished surface while reducing it in the interior. Following this, the polished surface is cleaned to further decrease the copper concentration. The annealing step is carefully controlled to ensure that the copper concentration does not increase significantly during storage.
Career Highlights
Corradi is associated with Memc Electronic Materials, Inc., a company known for its advancements in silicon wafer technology. His work has been instrumental in improving the quality and performance of silicon wafers used in various electronic applications.
Collaborations
Throughout his career, Corradi has collaborated with esteemed colleagues, including Robert J. Falster and Fabrizio Leoni. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
Alessandro Corradi's contributions to the field of silicon wafer technology exemplify the impact of innovative thinking in the electronics industry. His patent for the removal of copper from silicon wafers showcases his commitment to advancing semiconductor processing techniques.