Tepexpan, Mexico

Alejandro Morones Dobarganes

USPTO Granted Patents = 4 

 

Average Co-Inventor Count = 7.4

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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4 patents (USPTO):Explore Patents

Title: Alejandro Morones Dobarganes: Innovator in Concealed Pattern Detection

Introduction

Alejandro Morones Dobarganes is a notable inventor based in Tepexpan, Mexico. He has made significant contributions to the field of detection technologies, particularly in methods for identifying concealed patterns. With a total of 4 patents to his name, his work showcases a blend of creativity and technical expertise.

Latest Patents

Among his latest innovations is a method for detecting a concealed pattern. This method involves detecting infrared electromagnetic radiation that is either reflected or emitted by a component containing a first pattern. The component includes a substrate, the first pattern disposed over at least a portion of the substrate, and an optional primer layer situated between the substrate and the first pattern. Additionally, a first visibly opaque layer containing an infrared transparent pigment is placed over the first pattern. The method compares the reflectivity and/or absorbance of infrared electromagnetic radiation by the first pattern at one wavelength to that of the primer layer and/or the substrate at the same wavelength.

Career Highlights

Alejandro is currently employed at PPG Industries Ohio, Inc., where he continues to develop innovative solutions in his field. His work at PPG Industries has allowed him to apply his inventive skills in a corporate environment, contributing to advancements in detection technologies.

Collaborations

Throughout his career, Alejandro has collaborated with talented individuals such as Nicolas Benjamin Duarte and Zachary J Brown. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Alejandro Morones Dobarganes stands out as a prominent inventor in the realm of concealed pattern detection. His innovative methods and collaborative spirit contribute significantly to advancements in technology.

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