Seville, Spain

Alberto Maraña Jurado

This inventor holds 1 USPTO granted patent. Top assignee: 2Nd Skull, Inc.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alberto Maraña Jurado. Retrieved from https://idiyas.com/inventor/alberto-maraña-jurado

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovations of Alberto Maraña Jurado

Introduction

Alberto Maraña Jurado is a notable inventor based in Seville, Spain. He has made significant contributions to the field of protective gear through his innovative designs. His work focuses on enhancing safety and comfort for users in various activities.

Latest Patents

Alberto holds a patent for a protective headband. This headband features a fabric layer that defines pockets, with padding layers positioned circumferentially around the headband. An impact panel is strategically placed to be proximate to the forehead of the wearer. One of the padding layers is located behind the impact panel, ensuring that it is positioned between the impact panel and the forehead for added protection.

Career Highlights

Alberto is currently associated with 2nd Skull, Inc., a company dedicated to developing innovative protective solutions. His work at the company reflects his commitment to improving safety equipment for various sports and activities.

Collaborations

Alberto has collaborated with talented individuals such as Federico Olivares Velasco and Juan Solano Leiva. These partnerships have contributed to the development of effective safety solutions.

Conclusion

Alberto Maraña Jurado's innovative approach to protective gear exemplifies his dedication to safety and comfort. His patent for the protective headband showcases his ability to combine functionality with user needs.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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