Staines, United Kingdom

Alberto Gil C P Ramos

This inventor holds 2 USPTO granted patents and 3 EPO patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alberto Gil C P Ramos. Retrieved from https://idiyas.com/inventor/alberto-gil-c-p-ramos

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

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2 patents (USPTO):Explore Patents

Title: Innovations by Alberto Gil C P Ramos

Introduction

Alberto Gil C P Ramos is an accomplished inventor based in Staines, GB. He has made significant contributions to the field of neural networks, particularly through his innovative patent. His work focuses on enhancing the performance and efficiency of neural networks, making them more suitable for practical applications.

Latest Patents

Alberto holds a patent titled "Method and apparatus for conditioning neural networks." This patent outlines techniques that improve the generalizable performance of conditional neural networks while significantly reducing model size and latency. The resulting conditioned neural network is designed for on-device deployment, featuring a lower model size, reduced dynamic memory requirements, and decreased latency.

Career Highlights

Alberto is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of technology. His work at Samsung has allowed him to explore innovative solutions in the realm of artificial intelligence and machine learning.

Collaborations

Alberto has collaborated with notable colleagues, including Sourav Bhattacharya and Abhinav Mehrotra. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Alberto Gil C P Ramos is a prominent figure in the field of neural networks, with a focus on improving their efficiency and applicability. His contributions through patents and collaborations highlight his commitment to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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