Company Filing History:
Years Active: 2011
Title: Albert Peng: Innovator in Semiconductor Technology
Introduction
Albert Peng is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the efficiency of semiconductor substrates.
Latest Patents
Albert Peng holds a patent titled "Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants." This patent focuses on phosphorous-comprising dopants, methods for forming phosphorous-doped regions in semiconductor materials, and techniques for fabricating these dopants. The invention includes a phosphorous source that may consist of a phosphorous-comprising salt, a phosphorous-comprising acid, or phosphorous-comprising anions, combined with an alkaline material and a liquid medium.
Career Highlights
Albert Peng is currently employed at Honeywell International Inc., where he applies his expertise in semiconductor technology. His work at Honeywell has allowed him to further develop his innovative ideas and contribute to advancements in the industry.
Collaborations
Some of Albert's coworkers include Hong Min Huang and Carol Gao. Their collaboration fosters a creative environment that encourages innovation and the sharing of ideas.
Conclusion
Albert Peng is a distinguished inventor whose work in semiconductor technology has led to valuable advancements in the field. His patent on phosphorous-comprising dopants exemplifies his commitment to innovation and excellence.