Albert Lan

Title: Albert Lan - Innovator in Semiconductor Technology

Introduction

Albert Lan is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative approach to interconnect structures.

Latest Patents

Lan's latest patents focus on fan-out interconnect integration processes and structures. These processing methods are designed to form a fan-out interconnect structure, which includes forming a semiconductor active device structure overlying a first substrate. The semiconductor active device structure incorporates first conductive contacts. Additionally, the methods involve creating an interconnect structure overlying a second substrate, which includes second conductive contacts. The joining of the first substrate with the second substrate is a crucial step, as it couples the first conductive contacts with the second conductive contacts. Notably, the interconnect structure extends beyond the lateral dimensions of the semiconductor active device structure, enhancing its functionality.

Career Highlights

Albert Lan is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His work at Applied Materials has allowed him to further develop his expertise and contribute to cutting-edge technologies in semiconductor manufacturing.

Collaborations

Lan collaborates with various professionals in his field, including Richard W. Plavidal, who is also a key figure in semiconductor innovation.

Conclusion

Albert Lan's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of semiconductor interconnect structures.