Troy, NY, United States of America

Alana Gloria DeLoach

This inventor holds 1 USPTO granted patent. Top assignee: Rensselaer Polytechnic Institute. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alana Gloria DeLoach. Retrieved from https://idiyas.com/inventor/alana-gloria-deloach

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Alana Gloria DeLoach: Innovator in Sound Masking Technology

Introduction

Alana Gloria DeLoach is a notable inventor based in Troy, NY (US). She has made significant contributions to the field of sound masking technology, particularly in open-plan spaces. Her innovative approach aims to enhance acoustic comfort in environments where noise can be a distraction.

Latest Patents

Alana holds a patent for her invention titled "Sound masking in open-plan spaces using natural sounds." This patent describes a system, method, and program product for generating sound masking in an open-plan space. The method includes establishing a set of acoustic criteria for the space, mixing sound samples to create an audio output stream, and processing the audio output stream to ensure it meets specified frequency levels without exceeding a given threshold.

Career Highlights

Alana is affiliated with Rensselaer Polytechnic Institute, where she continues to develop her research and innovations. Her work focuses on improving the auditory experience in various environments, making her a valuable asset in the field of sound technology.

Collaborations

Alana has collaborated with notable colleagues, including Jonas Braasch and Jeffrey Parkman Carter. These partnerships have contributed to her research and the advancement of sound masking technologies.

Conclusion

Alana Gloria DeLoach is a pioneering inventor whose work in sound masking technology is making a significant impact in open-plan spaces. Her innovative solutions are helping to create more comfortable and productive environments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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