Palo Alto, CA, United States of America

Alan R Stivers



Average Co-Inventor Count = 1.9

ph-index = 5

Forward Citations = 117(Granted Patents)


Location History:

  • San Jose, CA (US) (2002 - 2003)
  • Palo Alto, CA (US) (2003 - 2007)

Company Filing History:


Years Active: 2002-2007

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8 patents (USPTO):Explore Patents

Title: Alan R Stivers: Innovator in Electromagnetic Radiation and Mask Pattern Translation

Introduction

Alan R Stivers is a notable inventor based in Palo Alto, CA. He has made significant contributions to the fields of electromagnetic radiation and mask pattern translation. With a total of 8 patents to his name, Stivers has demonstrated a commitment to innovation and technological advancement.

Latest Patents

Stivers' latest patents include a method for translation generation for a mask pattern. This invention describes the generation of one or more translations that can be applied to a mask pattern, allowing it to cover one or more mask defects either partially or completely. Another significant patent is a method and apparatus for producing electromagnetic radiation. This invention features a chamber wall enclosing a plasma emission chamber, which contains a plasma emission gas. The apparatus includes a first electrode and at least one second electrode that is rotatable about its axis. When a voltage is applied, a plasma is generated between the electrodes, showcasing Stivers' innovative approach to electromagnetic technology.

Career Highlights

Throughout his career, Alan R Stivers has worked with prominent organizations such as Intel Corporation and the University of California. His experience in these institutions has allowed him to develop and refine his inventions, contributing to advancements in technology.

Collaborations

Stivers has collaborated with notable colleagues, including Edita Tejnil and Ted Liang. These partnerships have likely enriched his work and fostered a collaborative environment for innovation.

Conclusion

Alan R Stivers is a distinguished inventor whose work in electromagnetic radiation and mask pattern translation has made a significant impact in his field. His patents reflect a deep understanding of technology and a commitment to solving complex problems.

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