Swanton, VT, United States of America

Alan Plaisted

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Alan Plaisted: Innovator in Rotary Sputtering Target Technology

Introduction

Alan Plaisted is a notable inventor based in Swanton, VT (US). He has made significant contributions to the field of manufacturing, particularly in the development of rotary sputtering targets. His innovative approach has led to the creation of a patented method that enhances the efficiency and effectiveness of sputtering processes.

Latest Patents

Alan Plaisted holds a patent for a "Method of manufacturing a rotary sputtering target using a mold." This invention outlines a process that includes several key steps. It involves providing a cylinder of sputtering target material with an adhesion-wetting layer on its inside surface. Additionally, it requires a stainless steel sputtering target backing tube that has an outside diameter smaller than the sputtering target material's inside diameter. The process also includes welding stainless steel retaining rings to the backing tube, ensuring that the target material is in compression while the backing tube is in tension. Finally, molten bonding material is introduced into the annulus between the backing tube and the sputtering target material.

Career Highlights

Alan Plaisted is currently associated with Soleras, Ltd., where he applies his expertise in manufacturing and innovation. His work has been instrumental in advancing the technology related to sputtering targets, which are essential in various applications, including semiconductor manufacturing and thin-film deposition.

Collaborations

Throughout his career, Alan has collaborated with talented individuals such as Al Nolette and Paul G Carter. These partnerships have contributed to the development of innovative solutions in the field of manufacturing.

Conclusion

Alan Plaisted's contributions to the field of rotary sputtering target technology exemplify the impact of innovation in manufacturing processes. His patented method not only enhances production efficiency but also showcases the importance of collaboration in driving technological advancements.

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