This inventor holds 1 USPTO granted patent. Top assignee: University of Kansas. Active years: 2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2018
Title: Alan Elliot: Innovator in Atomic Layer Deposition Technology
Introduction
Alan Elliot is a notable inventor based in Lee's Summit, MO (US). He has made significant contributions to the field of materials science, particularly in the area of atomic layer deposition. His innovative work has led to the development of advanced technologies that enhance the fabrication of multilayer structures.
Latest Patents
Alan Elliot holds a patent for an "Apparatus for in situ deposition of multilayer structures via atomic layer deposition and ultra-high vacuum physical or chemical vapor deposition." This apparatus is designed for the in situ fabrication of multilayer heterostructures. It comprises a first vacuum chamber for atomic layer deposition, a second vacuum chamber for ultra-high vacuum physical or chemical vapor deposition, and a load lock vacuum chamber that facilitates the transfer of substrates between these chambers. The design includes a substrate transport vacuum chamber equipped with a substrate transfer device, ensuring efficient and effective processing of materials.
Career Highlights
Alan Elliot is affiliated with the University of Kansas, where he continues to advance research in his field. His work has garnered attention for its potential applications in various industries, including electronics and nanotechnology. With a focus on innovation, he strives to push the boundaries of what is possible in material fabrication.
Collaborations
Throughout his career, Alan has collaborated with esteemed colleagues such as Judy Zhihong Wu and Rongtao Lu. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise, further enhancing the impact of their research.
Conclusion
Alan Elliot's contributions to atomic layer deposition technology exemplify the spirit of innovation in materials science. His patent and ongoing research at the University of Kansas highlight his commitment to advancing the field and developing new technologies that can benefit various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile