Rochester, NY, United States of America

Alan E Rosenbluth

This inventor holds 1 USPTO granted patent. Top assignee: University of Rochester. Active years: 1982.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 1982

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Alan E Rosenbluth: Innovator in X-ray Reflector Technology

Introduction

Alan E Rosenbluth is a notable inventor based in Rochester, NY (US). He has made significant contributions to the field of x-ray technology, particularly in the development of advanced mirror structures that enhance reflectivity at x-ray wavelengths.

Latest Patents

Rosenbluth holds a patent for "Normal incidence x-ray reflectors and resonant cavities for supporting." This patent describes mirror structures that provide high normal incidence reflectivities at x-ray wavelengths, specifically in the range of 70 A to 300 A. These structures utilize an array of repeated periods consisting of monoatomic metallic layers and Langmuir-Blodgett hydrocarbon molecular layers. The design allows for additional Langmuir-Blodgett bilayers to serve as spacer layers and reflection-enhancing metal films. The systematic deposition of these layers maximizes reflectance at the design wavelength, enabling the configuration of resonant cavities to support x-ray laser action.

Career Highlights

Rosenbluth is affiliated with the University of Rochester, where he has contributed to various research initiatives. His work has been instrumental in advancing the understanding and application of x-ray technology in scientific research.

Collaborations

One of his notable collaborators is James M Forsyth, with whom he has worked on various projects related to x-ray reflectors and resonant cavities.

Conclusion

Alan E Rosenbluth's innovative work in x-ray reflector technology has paved the way for advancements in the field. His contributions continue to influence research and applications in x-ray technology.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…