Company Filing History:
Years Active: 2007-2008
Title: Alan E. Leviton: Innovator in Polishing Pad Technology
Introduction
Alan E. Leviton is a notable inventor based in Newburyport, MA (US). He has made significant contributions to the field of chemical mechanical polishing pads, holding 2 patents that showcase his innovative approach to improving manufacturing processes.
Latest Patents
Leviton's latest patents include a method and apparatus for forming polishing pads with reduced striations. The method involves creating a chemical mechanical polishing pad by utilizing polymeric materials and microspheres. This process includes steps such as fluidizing the microspheres to reduce their initial bulk density and delivering the mixture to a mold for shaping. The apparatus complements this method by providing a delivery system that ensures the effective mixing of materials, ultimately leading to a high-quality polishing pad.
Career Highlights
Alan E. Leviton is associated with Rohm and Haas Electronic Materials Cmp Holdings, Inc., where he has applied his expertise in materials science to develop advanced polishing technologies. His work has been instrumental in enhancing the performance and efficiency of polishing pads used in various applications.
Collaborations
Leviton has collaborated with notable colleagues such as Joseph P. Koetas and Kari-Ell Norton. Their combined efforts have contributed to the advancement of polishing pad technology and the successful implementation of innovative solutions in the industry.
Conclusion
Alan E. Leviton stands out as a key figure in the development of polishing pad technology, with his patents reflecting a commitment to innovation and quality. His contributions continue to influence the field and pave the way for future advancements.