This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2012-2016.
Company Filing History:
Years Active: 2012-2016
Title: Alan Cheshire: Innovator in Substrate Etching Technologies
Introduction
Alan Cheshire is a prominent inventor based in Glasgow, GB. He has made significant contributions to the field of substrate etching, holding a total of 3 patents. His work focuses on developing advanced methods and apparatus for etching substrates in plasma etch reactors.
Latest Patents
Alan's latest patents include innovative techniques for etching substrates. One of his notable patents describes methods for etching a substrate in a plasma etch reactor. This method involves depositing polymer on surfaces of a feature formed in the substrate using first reactive species from a polymer forming gas. It also includes etching the bottom surface of the feature using a third reactive species from an etching gas, and bombarding the bottom surface with a second reactive species from an inert gas or oxidizing gas. Another patent outlines a substrate etching method and apparatus that includes flowing a backside process gas between a substrate and a substrate support assembly, allowing for cyclic etching of a layer on the substrate.
Career Highlights
Alan Cheshire is currently employed at Applied Materials, Inc., where he continues to innovate in the field of substrate etching technologies. His expertise and contributions have positioned him as a key figure in the industry.
Collaborations
Throughout his career, Alan has collaborated with notable colleagues, including Stanley Detmar and Robert P Chebi. These collaborations have further enhanced his work and contributions to the field.
Conclusion
Alan Cheshire's innovative work in substrate etching technologies has led to significant advancements in the industry. His patents reflect a deep understanding of plasma etch reactors and their applications.