San Jose, CA, United States of America

Alan Ablao

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2001.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2001

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1 patent (USPTO):Explore Patents

Title: Alan Ablao: Innovator in Remote Plasma Cleaning Technology

Introduction

Alan Ablao is a notable inventor based in San Jose, CA. He has made significant contributions to the field of processing chamber cleaning methods. His innovative approach utilizes microwave energy to enhance the efficiency of cleaning processes in various applications.

Latest Patents

Alan Ablao holds a patent for a "Remote plasma cleaning method for processing chambers." This method involves the use of microwave energy to generate reactive species that can effectively remove deposits from processing chambers. The technology allows for cleaning at different pressures and utilizes varying ratios of reactive and inert gases to optimize the cleaning process. This innovation not only improves the uniformity of cleaning but also increases the cleaning rate and enhances the residence time of reactive species in the chamber. He has 1 patent to his name.

Career Highlights

Ablao is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on developing advanced cleaning technologies that are crucial for maintaining the performance and longevity of processing equipment.

Collaborations

Throughout his career, Alan has collaborated with talented professionals such as Ravi Rajagopalan and Tim Casper. These collaborations have contributed to the advancement of cleaning technologies in the semiconductor industry.

Conclusion

Alan Ablao's innovative work in remote plasma cleaning methods showcases his commitment to enhancing processing technologies. His contributions are vital for the efficiency and effectiveness of cleaning processes in various applications.

Profile summary based on public USPTO records.
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