Sion, Switzerland

Alain Woeffray

This inventor holds 1 USPTO granted patent. Top assignee: Global Id Sa. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Alain Woeffray. Retrieved from https://idiyas.com/inventor/alain-woeffray

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 12.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Alain Woeffray

Introduction

Alain Woeffray is a notable inventor based in Sion, Switzerland. He has made significant contributions to the field of biometric technology. His work focuses on methods and devices that enhance the recognition and identification of individuals through vascular patterns.

Latest Patents

Woeffray holds a patent for a "Method and device for biometric vascular recognition and/or identification." This invention involves a method that captures multiple images of subcutaneous veins from various angles. The process includes determining whether the entity being examined is a spoof based on the likelihood that the captured images represent solid veins.

Career Highlights

Woeffray's career is marked by his dedication to advancing biometric recognition technologies. His innovative approach has led to the development of a unique device that improves the accuracy of vascular identification. He is currently associated with Global ID SA, where he continues to work on cutting-edge biometric solutions.

Collaborations

Throughout his career, Woeffray has collaborated with talented individuals such as Lambert Sonna Momo and Luciano Cerqueira Torres. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Alain Woeffray's contributions to biometric technology exemplify the spirit of innovation. His work not only enhances security measures but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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