Alain Frichet

Title: The Innovative Contributions of Alain Frichet

Introduction

Alain Frichet is a notable inventor based in Paris, France. He has made significant contributions to the field of optical alignment, particularly in the context of lithographic processes. His work has implications for the production of intricate designs and patterns in various technological applications.

Latest Patents

One of Alain Frichet's key patents is titled "Method for the optical alignment of designs in two near planes." This invention addresses the challenge of aligning designs on two planes, where one plane, known as the mask, carries the design to be reproduced on the second plane, referred to as the pattern. The method utilizes a pair of marks formed by a lens with linear Fresnel zones inscribed on the mask and a reflecting grating of appropriate width inscribed on the pattern. The invention employs a parallel beam of monochromatic light to create a rectangular illumination spot on the pattern, allowing for precise alignment and detection of intensity maxima or minima based on the reflection properties of the lines.

Career Highlights

Alain Frichet has been associated with Thomson-CSF, a prominent company in the field of technology and innovation. His work at this organization has allowed him to develop and refine his inventions, contributing to advancements in optical alignment techniques.

Collaborations

Throughout his career, Alain has collaborated with notable colleagues, including Bernard Fay and Jacques Trotel. These partnerships have fostered a collaborative environment that has enhanced the development of innovative solutions in their field.

Conclusion

Alain Frichet's contributions to optical alignment technology demonstrate his innovative spirit and commitment to advancing the field. His patent and collaborations reflect a dedication to precision and excellence in design reproduction.