Pegomas, France

Alain DuFour


 

Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 38(Granted Patents)


Location History:

  • Verneuil en Halatte, FR (2002)
  • Pegomas, FR (2018)

Company Filing History:


Years Active: 2002-2018

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Alain DuFour

Introduction

Alain DuFour is a notable inventor based in Pegomas, France. He has made significant contributions to the field of chemical engineering, particularly in the area of scale inhibition in aqueous systems. With a total of 3 patents to his name, DuFour's work has had a meaningful impact on various industrial applications.

Latest Patents

DuFour's latest patents focus on innovative methods for inhibiting silica scale formation. One of his patents describes a method that utilizes a hydrophobically-modified alkylene oxide urethane copolymer as an anti-scalant. This method effectively prevents silica scale formation in aqueous systems. Another patent outlines a similar approach, employing an amine-terminated polyoxyalkylene anti-scalant to achieve the same goal. These inventions demonstrate DuFour's commitment to advancing technology in water treatment processes.

Career Highlights

Throughout his career, Alain DuFour has worked with prominent companies in the chemical industry. Notably, he has been associated with Dow Global Technologies LLC and Rohm and Haas Company. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to the advancement of chemical engineering practices.

Collaborations

DuFour has collaborated with several talented individuals in his field. Among his coworkers are Somil Chandrakant Mehta and Yves Duccini, who have contributed to his projects and innovations.

Conclusion

Alain DuFour's contributions to the field of chemical engineering, particularly in silica scale inhibition, highlight his innovative spirit and dedication to solving complex industrial challenges. His patents and collaborations reflect a career marked by significant achievements and advancements in technology.

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