The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 06, 2018
Filed:
Jun. 02, 2015
Applicants:
Dow Global Technologies Llc, Midland, MI (US);
Rohm and Haas Company, Philadelphia, PA (US);
Inventors:
Somil Chandrakant Mehta, Mumbai, IN;
Alain DuFour, Pegomas, FR;
Assignees:
Dow Global Technologies LLC, Midland, MI (US);
Rohm and Haas Company, Midland, MI (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C02F 5/12 (2006.01); C02F 1/44 (2006.01); C08G 65/08 (2006.01); C02F 101/10 (2006.01); C02F 103/02 (2006.01); C02F 103/28 (2006.01); C02F 103/10 (2006.01);
U.S. Cl.
CPC ...
C02F 5/12 (2013.01); C02F 1/441 (2013.01); C08G 65/08 (2013.01); C02F 2101/10 (2013.01); C02F 2103/023 (2013.01); C02F 2103/10 (2013.01); C02F 2103/28 (2013.01); C02F 2303/22 (2013.01); C02F 2305/04 (2013.01);
Abstract
A method for inhibiting silica scale formation in an aqueous system by adding an amine-terminated polyoxyalkylene anti-scalant to the water used in the aqueous system.