This inventor holds 1 USPTO granted patent. Top assignees: Hokkaido University, Other. Active years: 2014.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 443 
1 out of 834,601 Years Active: 2014
Title: Akito Ono: Innovator in Nickel Thin Film Technology
Introduction
Akito Ono is a notable inventor based in Sapporo, Japan. He has made significant contributions to the field of materials science, particularly in the development of nickel thin films and their applications in nano-junction elements.
Latest Patents
Ono holds a patent for a nickel thin film, which includes a method for its formation, as well as a ferromagnetic nano-junction element and a method for producing this element. His innovative approach involves forming a nickel thin film with a thickness of 2 nm or more on a polyethylene naphthalate substrate using a vacuum evaporation method. This technology is crucial for creating magnetoresistance effect elements that utilize ferromagnetic nano-junctions.
Career Highlights
Throughout his career, Akito Ono has worked at Hokkaido University, where he has contributed to various research projects and advancements in his field. His work has garnered attention for its potential applications in electronics and materials engineering.
Collaborations
Ono has collaborated with esteemed colleagues such as Yoshihiko Hirotsu and Manabu Ishimaru, further enhancing the impact of his research and innovations.
Conclusion
Akito Ono's work in nickel thin film technology exemplifies the innovative spirit of modern inventors. His contributions continue to influence advancements in materials science and engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile