Tokyo, Japan

Akira Tokoh


Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 82(Granted Patents)


Company Filing History:


Years Active: 1993-1995

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4 patents (USPTO):Explore Patents

Title: Akira Tokoh: Innovator in Photo-Sensitive Resin Technology

Introduction

Akira Tokoh is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of photo-sensitive resin compositions, holding a total of 4 patents. His work focuses on enhancing the properties of resin materials used in various applications, particularly in the semiconductor industry.

Latest Patents

Tokoh's latest patents include a positive photo-sensitive resin composition that comprises a polybenzoxazole precursor as a base resin. This innovative composition also includes an organic solvent-soluble polymer or its precursor, such as a polyamic acid, which improves adhesion, flexibility, and heat resistance. Additionally, it features a diazoquinone compound and/or a dihydropyridine compound as a photosensitive agent. This resin composition is capable of forming high-resolution patterns and exhibits excellent adhesion and mechanical properties. Furthermore, Tokoh has developed three novel diazoquinone compounds that enhance resolution, contrast, and thick-film formability when used in positive photo-sensitive resin compositions. Another significant patent involves a photosensitive resin composition that includes a polyamic acid with specific recurring units, an amide compound with carbon-carbon double bonds, and a photosensitizer, which is utilized in semiconductor apparatus.

Career Highlights

Akira Tokoh is associated with Sumitomo Bakelite Company Limited, where he has been instrumental in advancing resin technology. His innovative approaches have positioned him as a key figure in the development of materials that meet the demands of modern electronics.

Collaborations

Tokoh has collaborated with notable colleagues, including Etsu Takeuchi and Toshiro Takeda, to further enhance the capabilities of photo-sensitive resin technologies.

Conclusion

Akira Tokoh's contributions to the field of photo-sensitive resin compositions have significantly impacted the semiconductor industry. His innovative patents and collaborative efforts continue to drive advancements in material science.

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