Company Filing History:
Years Active: 2003-2013
Title: Akira Terashi: Innovator in Sputtering Target Structures
Introduction
Akira Terashi is a notable inventor based in Fuji, Japan. He has made significant contributions to the field of materials science, particularly in the development of sputtering target structures. With a total of 2 patents, his work has had a considerable impact on manufacturing processes.
Latest Patents
One of Terashi's latest patents is a "Method for manufacturing a sputtering target structure." This invention aims to provide a sputtering target structure that possesses good machinability and thermal conductivity. It also ensures good wettability with soldering materials, is cost-effective, and can be reused for an extended period. The structure is designed to prevent issues such as cracking and peeling. The sputtering target structure is formed by bonding a sputtering target to a backing plate made from a material with a minimal difference in the linear expansion coefficient compared to the sputtering target material. Additionally, a copper plate with a thickness ranging from 0.3 to 1.5 mm is placed on at least one face of the backing plate.
Another significant patent is for a "Substrate support and method of fabricating the same." This invention outlines a fabrication method that includes assembling a subassembly with a first reinforcing member and a heating element. The subassembly is supported at least 40mm from the bottom of a mold, encapsulated with molten aluminum, and subjected to pressure. An alternative method involves a stud disposed through a heating element, sandwiched between two reinforcing members, and encapsulated in a similar manner.
Career Highlights
Throughout his career, Akira Terashi has worked with prominent companies such as Applied Materials, Inc. and Plansee SE. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the field of materials engineering.
Collaborations
Terashi has collaborated with several professionals in his field, including Naomi Matsumura and Masahiko Kowaka. These collaborations have further enriched his work and expanded the scope of his inventions.
Conclusion
Akira Terashi's contributions to the field of sputtering target structures and substrate support methods highlight his innovative spirit and dedication to advancing materials science. His patents reflect a commitment to improving manufacturing processes and enhancing product performance.