This inventor holds 2 USPTO granted patents. Top assignee: Sumitomo Chemical Company, Limited. Active years: 1980.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1980
Title: Akira Tanoue and Polymer Resin Innovations.
Introduction
Akira Tanoue is an inventor associated with Niihama, Japan, and Sumitomo Chemical Company, Limited. His work includes processes for preparing polymer resins, with a focus on particle formation and impact resistance. The supplied information lists 2 patents.
Latest Patents
Tanoue’s listed patents address methods for producing polymer resins through emulsion and suspension polymerization.
“Process for preparing polymer resins” describes initiating polymerization in an emulsion system, then adding a suspension stabilizer after monomer conversion reaches 5% by weight and before the emulsion breaks. Polymerization continues in a suspension system until completion. The process is intended to produce resin particles with an even size distribution and a smooth appearance.
“Process for preparing polymer resins of high impact resistance” describes coagulating a rubbery polymer latex in the presence of a suspension stabilizer and a coagulating agent. An ethylenic monomer is then added to the resulting aqueous suspension, and the mixture undergoes suspension polymerization to produce high-impact-resistance resin.
Career Highlights
Tanoue’s listed patent work reflects an emphasis on polymer processing and control of resin particle properties. The described methods combine suspension stabilization with polymerization techniques to address particle uniformity and impact resistance.
Collaborations
The supplied information identifies Sumitomo Chemical Company, Limited, as Tanoue’s company and lists Masatsune Kondo as a coworker. No further details about their specific collaboration are provided.
Conclusion
Akira Tanoue’s listed patents focus on practical polymer-resin production methods, including processes designed to improve particle uniformity and impact resistance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile