Himeji, Japan

Akira Takaragi

This inventor holds 4 USPTO granted patents and 2 published patent applications. Top assignees: Daicel Chemical Industries, Ltd., Other. Active years: 2002-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Takaragi. Retrieved from https://idiyas.com/inventor/akira-takaragi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 50.0

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 43(Granted Patents)


Company Filing History:


Years Active: 2002-2004

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4 patents (USPTO):Explore Patents

Title: Akira Takaragi: Innovator in Photoresist Technology

Introduction

Akira Takaragi is a notable inventor based in Himeji, Japan. He has made significant contributions to the field of photoresist technology, holding a total of 4 patents. His work has been instrumental in advancing materials used in various applications.

Latest Patents

Among his latest patents are innovations such as a polymeric compound and resin composition for photoresist. These patents include the "Photoresist polymeric compound" and "Photoresist resin composition," which showcase his expertise in developing advanced materials for the semiconductor industry.

Career Highlights

Throughout his career, Akira has worked with Daicel Chemical Industries, Ltd., where he has contributed to various projects and innovations. His experience in this prominent company has allowed him to refine his skills and expand his knowledge in the field.

Collaborations

Akira has collaborated with notable colleagues, including Yoshinori Funaki and Kiyoharu Tsutsumi. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Akira Takaragi is a distinguished inventor whose work in photoresist technology has made a lasting impact. His patents and collaborations reflect his commitment to innovation and excellence in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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