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Years Active: 2021
Title: Akira Shirakura: Innovator in Thin-Film Laminated Film Technology
Introduction
Akira Shirakura is a notable inventor based in Yokohama, Japan. He is recognized for his contributions to the field of thin-film laminated films, particularly in developing methods that enhance barrier properties while maintaining cost-effectiveness.
Latest Patents
Shirakura holds a patent for a laminated film that aims to provide a thin-film laminated film with excellent barrier properties at a low cost. The invention includes a method for producing this film using atmospheric-pressure plasma CVD, which is advantageous due to its low equipment and running costs. The thin film comprises a plastic film, a silicon oxide-based thin film, and an amorphous carbon-based thin film, with specific characteristics that enhance its performance.
Career Highlights
Throughout his career, Akira Shirakura has worked with prominent organizations, including Tetra Laval Holdings & Finance S.A. and Keio University. His experience in these institutions has contributed significantly to his expertise in the field of materials science and engineering.
Collaborations
Shirakura has collaborated with notable colleagues, including Tetsuya Suzuki and Yuya Futagami. Their joint efforts have further advanced the research and development of innovative materials.
Conclusion
Akira Shirakura's work in thin-film laminated film technology exemplifies the intersection of innovation and practicality. His contributions continue to influence the industry and pave the way for future advancements in material science.