Ibaraki, Japan

Akira Shimojyuku

This inventor holds 1 USPTO granted patent. Top assignee: Jx Metals Corporation. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Shimojyuku. Retrieved from https://idiyas.com/inventor/akira-shimojyuku

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Akira Shimojyuku: Innovator in Magnetic Film Technology

Introduction

Akira Shimojyuku is a notable inventor based in Ibaraki, Japan. He has made significant contributions to the field of magnetic film technology, particularly through his innovative patent.

Latest Patents

Shimojyuku holds a patent for a sputtering target, magnetic film, and method for producing magnetic film. This invention provides a sputtering target that can form a magnetic film with both good magnetic separation between magnetic grains and high coercive force simultaneously. The sputtering target comprises 1 at. % or more of Zn, with a part or all of Zn forming complex oxides of Zn—Ti—O and/or Zn—Si—O. Additionally, it contains 45 at. % or less of Pt, with the balance being Co and inevitable impurities, based on atomic ratios.

Career Highlights

Shimojyuku is associated with JX Metals Corporation, where he continues to advance his research and development in magnetic materials. His work has been instrumental in enhancing the performance of magnetic films used in various applications.

Collaborations

Some of his coworkers include Manami Masuda and Masayoshi Shimizu, who contribute to the innovative environment at JX Metals Corporation.

Conclusion

Akira Shimojyuku's contributions to magnetic film technology through his patent demonstrate his commitment to innovation in the field. His work continues to influence advancements in magnetic materials and their applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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