Tokyo, Japan

Akira Shimogawara

This inventor holds 1 USPTO granted patent. Top assignee: Mitsui Minings & Melting Co., Ltd.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Shimogawara. Retrieved from https://idiyas.com/inventor/akira-shimogawara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2005

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Akira Shimogawara: Innovator in Cerium-based Abrasive Materials

Introduction

Akira Shimogawara is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of abrasive materials, particularly through his innovative work on cerium-based abrasives. His inventions focus on enhancing polishing properties while minimizing defects.

Latest Patents

Shimogawara holds a patent for a cerium-based abrasive material and its preparation method. This invention provides a cerium-based abrasive that excels in polishing speed and reduces the formation of polishing scratches. The abrasive maintains specific color ranges and can stably incorporate fluorine. The cerium-based abrasive includes cerium oxide as a main component, with defined values in the L*a*b* color system, ensuring optimal performance.

Career Highlights

Shimogawara is associated with Mitsui Mining & Smelting Co., Ltd., where he continues to develop innovative materials. His work has been instrumental in advancing the technology behind abrasive materials, making them more effective for various applications.

Collaborations

Some of his coworkers include Hiroyuki Watanabe and Naoyoshi Mochizuki, who contribute to the collaborative efforts in research and development within the company.

Conclusion

Akira Shimogawara's contributions to cerium-based abrasive materials highlight his innovative spirit and dedication to improving polishing technologies. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…