Akira Shibuya

Title: Akira Shibuya: Innovator in Semiconductor and Dust Collection Technologies

Introduction

Akira Shibuya is a notable inventor based in Narashino, Japan. He has made significant contributions to the fields of semiconductor technology and dust collection systems. With a total of 2 patents, his work showcases innovative solutions to complex engineering challenges.

Latest Patents

Shibuya's latest patents include a GaAs MIS device and an electric dust collecting apparatus. The GaAs MIS device features a combination of a semiconductor region primarily consisting of Al.sub.x Ga.sub.1-x As, an insulating film made of GaAs.sub.x P.sub.y O.sub.z, and a passivation film. This design results in an extremely low leakage current, enabling the realization of an excellent MISFET by forming a gate electrode on the laminated insulating film. The electric dust collecting apparatus is designed with multiple linear discharge electrodes and planar dust collecting electrodes within a casing. This innovative design allows for effective charging and collection of dust from a gas stream, enhancing the efficiency of dust removal processes.

Career Highlights

Throughout his career, Akira Shibuya has worked with various companies, including Asahi Kogyosha Co., Ltd. His experience in these organizations has contributed to his expertise in developing advanced technologies.

Collaborations

Shibuya has collaborated with notable individuals in his field, including Yoshifumi Nitta and Kazuo Hattori. These partnerships have likely fostered innovation and the exchange of ideas, further enhancing his contributions to technology.

Conclusion

Akira Shibuya's work in semiconductor devices and dust collection systems exemplifies his innovative spirit and dedication to advancing technology. His patents reflect a commitment to solving real-world problems through engineering and design.